学术论文

C. Li, S.F. Mao, Y.B. Zou, Y.G. Li, P. Zhang, H.M. Li and Z.J. Ding
A Monte Carlo Modeling on Charging Effect for Structures with Arbitrary Geometries
J. Phys. D: Appl. Phys. 51 (2018) 165301.

张增明、丁泽军、毛世峰、曾荣光、达博、张鹏、阮瞩、唐涛
表面化学分析 俄歇电子能谱 荷电控制与校正方法报告的规范要求
国家标准,GB/T 32998-2016 (2016.10.13发布,2017.09.01实施).

P. Zhang, S.F. Mao and Z.J. Ding
Monte Carlo Study of the Effective Electron Beam Shape in Scanning Electron Microscopic Imaging
Eur. Phys. J. Appl. Phys. 69 (2015) 30703.

Y.B. Zou, P. Zhang, S.F. Mao and Z.J. Ding
Model-Based Library for Critical Dimension Metrology by CD-SEM
Microsc. Microanal. 20 (Suppl 3) (2014) 6-7.
6th Meeting of the International Union of Microbeam Analysis Societies (IUMAS) conjuncted with Microscopy & Microanalysis (M&M) 2014, USA (Hartford), Aug. 2-7, 2014 (oral).

Z. Ruan, P. Zhang, S.F. Mao, H.M. Li and Z. J. Ding
Monte Carlo Study of the Influence of Electron Beam Focusing to SEM Image Sharpness Measurement
e-J. Surf. Sci. Nanotech. 2 (2014) 247-251.
9th International Symposium on Atomic Level Characterizations for New Materials and Devices'13--ALC'13, USA (Hawaii), Dec. 2-6, 2013 (poster).

Z. Ruan, S.F. Mao, P. Zhang, H.M. Li and Z.J. Ding
Monte Carlo Simulation of Realistic Beam-Sample Interaction in SEM: Application to Evaluation of Sharpness Measurement Methods
Proc. of SPIE 8729 (2013) 87290J.
Scanning Microscopies 2013: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences, USA (Baltimore), Apr. 29-May 3, 2013 (oral).

P. Zhang, Z.M. Zhang, S.F. Mao and Z.J. Ding
Monte Carlo Study of the Influence of Electron Beam Focusing to SEM Linewidth Measurement
Proc. of SPIE 8729 (2013) 87290K.
Scanning Microscopies 2013: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences, USA (Baltimore), Apr. 29-May 3, 2013 (oral).

P. Zhang, J. Wang, Y. Sun and Z.J. Ding
Charging Effect in Plasma Etching Mask of Hole Array
Plasma Sci. Technol. 15 (2013) 570.

Y.G. Li, P. Zhang and Z.J. Ding
Monte Carlo Simulation of CD-SEM Images for Linewidth and Critical Dimension Metrology
Scanning 35 (2013) 127-139.

P. Zhang, H.Y. Wang, Y.G. Li, S.F. Mao and Z.J. Ding
Monte Carlo Simulation of Secondary Electron Images for Real Sample Structures in Scanning Electron Microscopy
Scanning 34 (2012) 145-150.

Z. Ruan, S.F. Mao, P. Zhang and Z.J. Ding
Quantum Monte Carlo Modeling for Atomic Scale Secondary Electron Imaging in STEM
International Symposium on Advanced Electron Microscopy Theory and Application, Beijing, China, Jan 5-7, 2012 (poster).

Z. Ruan, S.F. Mao, P. Zhang and Z.J. Ding
Monte Carlo Modeling for SEM Image Simulation-Realistic Surface Topography and Instrumental Condition
2011 International Conference on Computational Intelligence and Software Engineering (CiSE 2011), China (Wuhan), Dec 9-11, 2011 (oral).

Z.J. Ding, P. Zhang, R.G. Zeng and S.F. Mao
Recent Development of Monte Carlo Methods for Study of Electron-Solid Interactions
8th International Symposium on Atomic Level Characterizations for New Materials and Devices--ALC-11, Korea (Seoul), May 22-27, 2011 (oral).

Z.J. Ding, Z.M. Zhang, S.F. Mao, B. Da, R.G. Zeng, P. Zhang, H.P. Mei, Y.G. Li and H.M. Li
Theoretical Study of Electron Interaction with Solid Surface for Application to Surface Electron Spectroscopy and Microscopy
18th International Vacuum Congress--IVC-18, China (Beijing), Aug. 23-27, 2010 (invited).

P. Zhang, J. Wang and Z.J. Ding
Charging Effect in Plasma Etching Mask of Round Holes in Hexagonal Array
18th International Vacuum Congress--IVC-18, China (Beijing), Aug. 23-27, 2010 (oral).

K. Salma, Z.J. Ding, Z.M. Zhang, P. Zhang, K. Tokesi, D. Varga and J. Toth
Quantification of Surface Effects: Monte Carlo Simulation of REELS Spectra to Obtain Surface Excitation Parameter
Surf. Sci. 603 (2009) 1236-1243.

Z.J. Ding, Y.G. Li, R.G. Zeng, S.F. Mao, P. Zhang and Z.M. Zhang
Depth Distribution Functions of Secondary Electron Production and Emission
International Workshop for Surface Analysis and Standardization'09, Japan (Okinawa), March 15-18, 2009 (invited).
J. Surf. Anal. 15 (2009) 249-253.

P. Zhang, Z.M. Zhang and Z.J. Ding
Thickness Analysis of Nanometer Thin Films Based on Electron Yields
International Conference on Nanoscience & Technology--ChinaNano 2009, China (Beijing), Sep. 1-3, 2009 (oral).