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2006-04-30:
Monte Carlo Simulation of Electrons Transmitting Through Masks
2005-12-22:
Monte Carlo simulation of electron beam lithography
2005-11-23:
Low-energy electron lithography including secondary electron emitted
2005-11-02:
Monte Carlo Simulation of Low-energy Electron Lithography
2005-09-14:
The models of Monte Carlo simulation of the scattering mask for electron lithography
2005-06-24:
Work progress
2005-05-18:
Proximity effect correction using pattern shape modification and area density map
2005-04-20:
Calculation of changes in dimensions to compensate for proximity effects in electron lithography
2005-03-09:
Development of Positive Photoresists
2004-12-15:
Direct-write electron beam lithography and dose modification method
2004-11-10:
Trajectory and energy deposition profile of the high energetic electrons in the Resists and Substrates
2004-10-08:
Enhanced pattern area density proximity effect correction
2004-09-15:
电子束光刻邻近效应的修正
2004-05-08:
Scattering angular limitation for projection electron lithography (SCALPEL)
0000-00-00:
α粒子散射的多媒体教学